Process Controller
Process Controller
Reactive Gas Controller(Speedflo, GENCOA)
Speedflo(GENCOA) technology is continuously being developed, pushing the operating window
and helping end-users to get even more from the process
  • Speedflo Standard(GENCOA)
    Speedflo Standard(GENCOA)
  • Speedflo Standard(GENCOA)
    Speedflo Standard(GENCOA)
  • Speedflo Mini(GENCOA)
    Speedflo Mini(GENCOA)
Speedflo
  • Increased sputter rates
    • Speedflo is a very powerful tool for rate enhancement & control in reactive sputtering.
    • it is possible to increase sputter rates many times, compared to usi
  • Improved uniformity
    • Speedflo can receive up to 8 sensor inputs and simultaneously control 8 gas MFCs.
  • Better process monitoring
    • Speedflo can use an input from many sensors within the process to provide a high speed actuation to the gas flow.
    • Speedflo’s plasma emission monitoring (PEM) sensor is commonly used to measure the intensity of individual species within the plasma, such as the metal or reactive gas species.
    • Speedflo’s advanced control architecture can also use other sensor types, such as target voltage or oxygen partial pressure, to provide the feedback from the process.